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Thin Films Laboratory

Thin Films

The Thin Films Laboratory is home to the nation’s first AIXTRON 2-dimensional close coupled showerhead metal organic vapor phase epitaxy system qualified with H2S and H2Se for 2d materials growth. It has 12 MOG sources and 6 process gases. The tool is complemented by a custom-built 1” quartz tube furnace, a PlanarTech 3” Quartz Tube furnace, and 2 MTI furnaces for chemical vapor transport and MXene synthesis. Interested users and collaborators may contact Prof. David Estrada to learn about accessing equipment and/or requesting samples. A full list of equipment is here:

  • Aixtron 2D Cold Coupled Showerhead Metalorganic Vapor Phase Epitaxy (MOVPE) System
    • 12 metalorganic sources with 12 Epison 5 controllers
    • 5 process gasses (H2S, H2Se, NH3, CH4, H2)
    • N2 and Ar carrier gasses
    • 1400 C 3” x 2” CCS Tungsten 3-zone furnace with Graphite Reactor
    • Full flow and stop flow modes
    • Argus top-side temperature control and Laytec EpiTT® 3W In-situ process monitoring
  • PlanarTech planarGROW-3S-TMD 3-zone Thermal Chemical Vapor Deposition (CVD) System
    • 3″ (75mm) OD Quartz Tube
    • One (1) x 3-Zone Fixed Furnace
      • 1,100°C
      • 100/300/100mm Heating Zones
    • Three (3) MFCs for Ar, H2 & CH4
    • LN2 Cold Trap & H2 Dilution Kit
    • 250l/m Dry Scroll Pump
    • Auto-Pressure Control
    • 1000 Torr Capacitance Manometer
    • Motorized Throttle Valve
    • Fully Automated PC Control w/ LabVIEW Front End
    • 2 solid source heating kits
  • MBraun UniLab Pro PS Glovebox System
    • 3 glove system
    • Copper catalyst and carbon filter work together to provide an in-box atmosphere of O2 and H2O <1ppm
    • Equipped with scale and hot plate
    • Capable of air sensitive chemical reactions, with top purge valve to snorkel hood for easy environmental purge and generated gas removal
  • Custom built quartz tube variable pressure chemical vapor deposition system with 4 inlet gases and up to two solid-source precursors.
  • MTI 2” Alumina Tube furnace with inert gas inlet and vacuum compatible (qty. 2)
    • Vacuum or inert gas environment
    • 5 – 10°C/min heating rate
    • 23°C – 1500°C capability
  • Kurt J Lesker Thin Film Sputter Machine
    • Physical Vapor Deposition system with RF and DC target sputtering capability. 100mm tooling, heated substrate, load lock, film thickness monitor, substrate biasing.
  • Kurt J Lesker PRO Line PVD 75 Thin Film Deposition System
    • KL-6, 4-pocket E-Beam Source with 5 kW power supply
    • Thermal evaporation – bank of two sources with independent pneumatically actuated shutters
    • Rotation, up 350⁰C heated substrate holder
    • Single substrate load lock with turbo pump