Oxford PlasmaLab System 100

Manufacturer:

Oxford Instruments

Model:

PlasmaLab System 100

Description:

Reactive ion etching (RIE) using fluorine based gases. 100mm tooling with load lock.

List of process capabilities

• BOSCH etch
• Silicon Nitride Etch (Si3N4)
• Silicon Cryo-etch (Si)
• Silicon Dioxide Etch (SiO2)
• Metal Etch