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Structural Evolution of ALD MoS2


24 July 2018 – Steve Letourneau, PhD graduate of the Micron School of Materials Science and Engineering, and a team of researchers from Argonne National Lab, the University of New South Wales, and the Air Force Research Lab recently published a study of the structural evolution of MoS2 grown by atomic layer deposition (ALD). The films were grown at 200 C using MoF6 and H2S and were amorphous as deposited. Using X-ray absorption spectroscopy and high-energy X-ray scattering experiments at the Advanced Photon Source, the team was able to reconstruct the film local coordination environment and perform reverse Monte Carlo (RMC) modeling to reveal how the films form a two-dimensional layered structure upon annealing.

This work was published in ACS Applied Nano Materials: